UV-irradiation induced modification of PDMS films investigated by XPS and spectroscopic ellipsometry

被引：147

作者：

Schnyder, B ^{[1
]}

Lippert, T

Kötz, R

Wokaun, A

Graubner, VM

Nuyken, O

机构：

[1] Paul Scherrer Inst, Gen Energy Dept, CH-5232 Villigen, Switzerland

[2] Tech Univ Munich, Lehrstuhl Makromol Stoffe, D-85747 Munich, Germany

来源：

SURFACE SCIENCE | 2003年 / 532卷

关键词：

ellipsometry; X-ray photoelectron spectroscopy; photochemistry; silicon oxides; ozone; amorphous surfaces; coatings; insulating films;

D O I：

10.1016/S0039-6028(03)00148-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

UV-irradiation (172 nm) induced changes of PDMS surfaces were investigated with X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry (SE). Both methods indicate the modification of the PDMS to a silica-like surface NOD. These conclusions could be drawn from the elemental composition determined by XPS and the binding energy shifts in the XPS spectra of the Si 2p and O 1s levels. Similarly the refractive index n determined with ellipsometry reaches a value close to the one of SiO2. Additionally, ellipsometry allows to monitor the decrease of the original film thickness with increasing UV-irradiation time. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：1067 / 1071

页数：5

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