Synthesis of Thin-Film Metal Pyrites by an Atomic Layer Deposition Approach

被引:17
作者
Wang, Jue [1 ]
Guo, Zheng [1 ]
Xiong, Wei [1 ]
Wang, Xinwei [1 ]
机构
[1] Peking Univ, Shenzhen Grad Sch, Sch Adv Mat, Shenzhen 518055, Peoples R China
关键词
ALD; atomic layer deposition; conformal coating; metal sulfide; pyrite; OXYGEN REDUCTION; COBALT SULFIDE; IRON-OXIDE; FES2; FILMS; WATER OXIDATION; MODEL CATALYSTS; NICKEL SULFIDE; GROWTH; PERFORMANCE; EFFICIENT;
D O I
10.1002/chem.201803327
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Late 3d transition metal disulfides (MS2, M=Fe, Co, Ni, Cu, Zn) can crystallize in an interesting cubic-pyrite structure, in which all the metal cations are in a low-spin electronic configuration with progressive increase of the e(g) electrons for M=Fe-Zn. These metal pyrite compounds exhibit very diverse and intriguing electrical and magnetic properties, which have stimulated considerable attention for various applications, especially in cutting-edge energy conversion and storage technologies. The synthesis of the metal pyrites is certainly very important, because highly controllable, reproducible, and reliable synthesis methods are virtually essential for both fundamental materials research and practical engineering. In this Concept, a new approach of (plasma-assisted) atomic layer deposition (ALD) to synthesize the thin-film metal pyrites (FeS2, CoS2, NiS2) is introduced. The ALD synthesis approach allows for atomic-precision control over film composition and thickness, excellent film uniformity and conformality, and superior process reproducibility, and therefore it is of high promise for uniformly conformal metal pyrite thin-film coatings on complex 3D structures in general. Details and implications of this ALD approach are discussed in this Concept, mainly from a conceptual perspective, and it is envisioned that, with this new ALD synthesis approach, a significant amount of new studies will be enabled on both the fundamentals, and novel applications of the metal pyrite materials.
引用
收藏
页码:18568 / 18574
页数:7
相关论文
共 90 条
[21]  
Guo Z., 2018, ANGEW CHEM, V130, P6000
[22]   Atomic Layer Deposition of the Metal Pyrites FeS2, CoS2, and NiS2 [J].
Guo, Zheng ;
Wang, Xinwei .
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 2018, 57 (20) :5898-5902
[23]   Atomic Layer Deposition of Rhenium Disulfide [J].
Hamalainen, Jani ;
Mattinen, Miika ;
Mizohata, Kenichiro ;
Meinander, Kristoffer ;
Vehkamaki, Marko ;
Raisanen, Jyrki ;
Ritala, Mikko ;
Leskela, Markku .
ADVANCED MATERIALS, 2018, 30 (24)
[24]   A Nitrogen Doping Method for CoS2 Electrocatalysts with Enhanced Water Oxidation Performance [J].
Hao, Jinhui ;
Yang, Wenshu ;
Peng, Zhen ;
Zhang, Chi ;
Huang, Zhipeng ;
Shi, Weidong .
ACS CATALYSIS, 2017, 7 (06) :4214-4220
[25]   Low-Dimensional Hyperthin FeS2 Nanostructures for Efficient and Stable Hydrogen Evolution Electrocatalysis [J].
Jasion, Daniel ;
Barforoush, Joseph M. ;
Qiao, Qiao ;
Zhu, Yimei ;
Ren, Shenqiang ;
Leonard, Kevin C. .
ACS CATALYSIS, 2015, 5 (11) :6653-6657
[26]   Chemoselective Transfer Hydrogenation of Nitroarenes Catalyzed by Highly Dispersed, Supported Nickel Nanoparticles [J].
Jiang, Chengjun ;
Shang, Zeyu ;
Liang, Xinhua .
ACS CATALYSIS, 2015, 5 (08) :4814-4818
[27]   A brief review of atomic layer deposition: from fundamentals to applications [J].
Johnson, Richard W. ;
Hultqvist, Adam ;
Bent, Stacey F. .
MATERIALS TODAY, 2014, 17 (05) :236-246
[28]  
Jurca T., 2017, Angew. Chemie, V129, P5073
[29]   Low-Temperature Atomic Layer Deposition of MoS2 Films [J].
Jurca, Titel ;
Moody, Michael J. ;
Henning, Alex ;
Emery, Jonathan D. ;
Wang, Binghao ;
Tan, Jeffrey M. ;
Lohr, Tracy L. ;
Lauhon, Lincoln J. ;
Marks, Tobin J. .
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 2017, 56 (18) :4991-4995
[30]   Comparison of co films deposited by remote plasma atomic layer deposition method with cyclopentadienylcobalt dicarbonyl [CpCo(CO)2] and dicobalt octacarbonyl [Co2(CO)8] [J].
Kim, Keunjun ;
Lee, Keunwoo ;
Han, Sejin ;
Park, Taeyong ;
Lee, Youngjin ;
Kim, Jeongtae ;
Yeom, Seungjin ;
Jeon, Hyeongtag .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2007, 46 (8-11) :L173-L176