Phase composition of the buried silicon interlayers in the amorphous multilayer nanostructures [(Co45Fe45Zr10)/a-Si:H]41 and [(Co45Fe45Zr10)35(Al2O3)65/a-Si:H]41

We consider two amorphous multilayer nanostructures (MLNS) [(Co45Fe45Zr10)/a-Si:H](41)-I and [(Co45Fe45Zr10)(35)(Al2O3)(65)/a-Si:H](41)-II that were obtained by ion-beam sputtering. For determination of the phase composition of the buried amorphous silicon interlayers in these MLNS, we used nondestructive ultrasoft X-ray emission spectroscopy technique (USXES). The use of the USXES enables to register the silicon Si L-2,L-3-spectra providing the information about the local partial densities of Si s and d occupied states of silicon valence band in silicon-contained materials. According to the simulation and fitting procedure to the experimental data, Fe3Si and a small amount of oxide (SiO2:H) were found in the interlayer of MLNS-I. At the same time, the content of silicon dioxides (SiO2) decrease from surface layers to the deep ones. On the other hand, simulation of the phase composition of MLNS-II reveals the presence of the silicides Fe3Si and Co2Si, oxides SiO2 and SiO1.3, and a small amount of a-Si:H. The percentage of cobalt silicide Co2Si and suboxide SiO1.3 increased in the deep layers of the MLNS-II.