Optical evidence for quantization in transparent amorphous oxide semiconductor superlattice

被引:22
作者
Abe, Katsumi [1 ]
Nomura, Kenji [2 ]
Kamiya, Toshio [1 ]
Hosono, Hideo [1 ,2 ]
机构
[1] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan
[2] Tokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268503, Japan
关键词
ELECTRONIC-STRUCTURE; MOBILITY; TRANSPORT; SILICON;
D O I
10.1103/PhysRevB.86.081202
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We fabricated transparent amorphous oxide semiconductor superlattices composed of In-Ga-Zn-O (a-IGZO) well layers and Ga2O3 (a-Ga2O3) barrier layers, and investigated their optical absorption properties to examine energy quantization in the a-IGZO well layer. The Tauc gap of a-IGZO well layers monotonically increases with decreasing well thickness at <= 5 nm. The thickness dependence of the Tauc gap is quantitatively explained by a Kronig-Penny model employing a conduction band offset of 1.2 eV between the a-IGZO and the a-Ga2O3, and the effective masses of 0.35m(0) for the a-IGZO well layer and 0.5m(0) for the a-Ga2O3 barrier layer, where m(0) is the electron rest mass. This result demonstrates the quantization in the a-IGZO well layer. The phase relaxation length of the a-IGZO is estimated to be larger than 3.5 nm.
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页数:4
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共 20 条
[11]   HALL-EFFECT AND IMPURITY CONDUCTION IN SUBSTITUTIONALLY DOPED AMORPHOUS SILICON [J].
LECOMBER, PG ;
JONES, DI ;
SPEAR, WE .
PHILOSOPHICAL MAGAZINE, 1977, 35 (05) :1173-1187
[12]   ANDERSON TRANSITION IN ACCUMULATION LAYER OF A-SI-H THIN-FILM TRANSISTOR [J].
LEROUX, T ;
CHENEVASPAULE, A .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1985, 77-8 :443-446
[13]   DEPENDENCE OF HALL-MOBILITY ON COMPOSITION IN AS2(S,SE,TE)3 GLASSES [J].
MYTILINEOU, E ;
ROILOS, M .
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1978, 37 (03) :387-396
[14]   Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors [J].
Nomura, K ;
Ohta, H ;
Takagi, A ;
Kamiya, T ;
Hirano, M ;
Hosono, H .
NATURE, 2004, 432 (7016) :488-492
[15]   Large enhancement of the thermoelectric Seebeck coefficient for amorphous oxide semiconductor superlattices with extremely thin conductive layers [J].
Ohta, Hiromichi ;
Huang, Rong ;
Ikuhara, Yuichi .
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2008, 2 (03) :105-107
[16]   ELECTRON-DRIFT MOBILITY IN DOPED AMORPHOUS-SILICON [J].
STREET, RA ;
KAKALIOS, J ;
HACK, M .
PHYSICAL REVIEW B, 1988, 38 (08) :5603-5609
[17]   Carrier transport and electronic structure in amorphous oxide semiconductor, a-InGaZnO4 [J].
Takagi, A ;
Nomura, K ;
Ohta, H ;
Yanagi, H ;
Kamiya, T ;
Hirano, M ;
Hosono, H .
THIN SOLID FILMS, 2005, 486 (1-2) :38-41
[18]   Anisotropy of electrical and optical properties in beta-Ga2O3 single crystals [J].
Ueda, N ;
Hosono, H ;
Waseda, R ;
Kawazoe, H .
APPLIED PHYSICS LETTERS, 1997, 71 (07) :933-935
[19]   AHARONOV-BOHM EFFECT IN NORMAL METAL QUANTUM COHERENCE AND TRANSPORT [J].
WASHBURN, S ;
WEBB, RA .
ADVANCES IN PHYSICS, 1986, 35 (04) :375-422
[20]   High-mobility thin-film transistor with amorphous InGaZnO4 channel fabricated by room temperature rf-magnetron sputtering [J].
Yabuta, Hisato ;
Sano, Masafumi ;
Abe, Katsumi ;
Aiba, Toshiaki ;
Den, Tohru ;
Kumomi, Hideya ;
Nomura, Kenji ;
Kamiya, Toshio ;
Hosono, Hideo .
APPLIED PHYSICS LETTERS, 2006, 89 (11)