Optical calibration for nanocalorimeter measurements

被引：25

作者：

Swaminathan, P. ^{[1
,2
]}

Burke, B. G. ^{[2
]}

Holness, A. E. ^{[2
]}

Wilthan, B. ^{[3
]}

Hanssen, L. ^{[3
]}

Weihs, T. P. ^{[1
]}

LaVan, D. A. ^{[2
]}

机构：

[1] Johns Hopkins Univ, Dept Mat Sci & Engn, Baltimore, MD 21218 USA

[2] Natl Inst Stand & Technol, Div Ceram, Mat Measurement Lab, Gaithersburg, MD 20899 USA

[3] Natl Inst Stand & Technol, Opt Technol Div, Phys Measurement Lab, Gaithersburg, MD 20899 USA

来源：

THERMOCHIMICA ACTA | 2011年 / 522卷 / 1-2期

基金：

美国国家科学基金会;

关键词：

Nanocalorimetry; Nanocalorimeter; Platinum emissivity; Thin film; Melting point; Calibration; FILM; EMISSIVITY;

D O I：

10.1016/j.tca.2011.03.006

中图分类号：

O414.1 [热力学];

学科分类号：

摘要：

We describe a method for calibration of nanocalorimeters from 573 K to 873 K, using resistive heating and optical pyrometry for temperature measurement. A platinum strip suspended on a silicon nitride membrane serves as both heater and temperature sensor. The calibration described here, relating resistance to temperature, enables subsequent temperature measurement. Measurements of the emissivity of as-deposited and annealed platinum thin films were also performed as a function of wavelength and temperature; these measurements are needed to correct the temperature recorded using the pyrometer. The calibration was validated by measurement of the melting point of a pure aluminum film: the melting point established with a Gaussian fit to the dT/dt data agreed within 0.1%(0.7 K) at 933.5 K. The melting point established from the minimum in the dT/dt plot agreed within 0.6% (5.5 K) at 933.5K. Finite element modeling was used to characterize the temperature distribution. Published by Elsevier B.V.

引用

页码：60 / 65

页数：6

共 19 条

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