Molecular Engineering of UV/Vis Light-Emitting Diode (LED)-Sensitive Donor--Acceptor-Type Sulfonium Salt Photoacid Generators: Design, Synthesis, and Study of Photochemical and Photophysical Properties

被引:19
作者
Wu, Xingyu [1 ]
Jin, Ming [1 ]
Xie, Jianchao [1 ]
Malval, Jean-Pierre [2 ]
Wan, Decheng [1 ]
机构
[1] Tongji Univ, Sch Mat Sci & Engn, 4800 Caoan Rd, Shanghai 201804, Peoples R China
[2] Univ Haute Alsace, Inst Sci Mat Mulhouse, UMR CNRS 7361, 15 Rue Jean Starcky, F-68057 Mulhouse, France
基金
中国国家自然科学基金;
关键词
conjugation; donor-acceptor systems; photochemistry; photophysics; structure-activity relationships; CATIONIC-POLYMERIZATION; N-VINYLCARBAZOLE; PHOTOPOLYMERIZATION; PHOTOINITIATOR; DERIVATIVES; CLEAVAGE; DYES; LEDS;
D O I
10.1002/chem.201703414
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A series of donor--acceptor-type sulfonium salt photoacid generators (PAGs) were designed and synthesized by systematically changing electron-donating groups, -conjugated systems, electron-withdrawing groups, and the number of branches through molecular engineering. These PAGs can effectively decompose under UV/Vis irradiation from a light-emitting diode (LED) light source because of the matching absorption and emitting spectra of the LEDs. The absorption and acid-generation properties of these sulfonium salts were elucidated by UV/Vis spectroscopy and so forth. Results indicated that the PAG performance benefited from the introduction of strong electron-donating groups, specific -conjugated structures, certain electron-withdrawing groups, or two-branched structures. Most sulfonium salts showed potential as photoinitiators under irradiation by a wide variety of UV and visible LEDs.
引用
收藏
页码:15783 / 15789
页数:7
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[1]   UV-LED photopolymerised monoliths [J].
Abele, Silvija ;
Nie, Fu-Qiang ;
Foret, Frantisek ;
Paull, Brett ;
Macka, Mirek .
ANALYST, 2008, 133 (07) :864-866
[2]   HEALTH-HAZARDS OF TERTIARY AMINE CATALYSTS [J].
ALBRECHT, WN ;
STEPHENSON, RL .
SCANDINAVIAN JOURNAL OF WORK ENVIRONMENT & HEALTH, 1988, 14 (04) :209-219
[3]   Photo-curing kinetics for the UV-initiated cationic polymerization of a cycloaliphatic diepoxide system photosensitized by thioxanthone [J].
Cho, JD ;
Hong, JW .
EUROPEAN POLYMER JOURNAL, 2005, 41 (02) :367-374
[4]  
Cordon C., 2013, RADTECH INT
[5]  
Crivello JV, 1999, J POLYM SCI POL CHEM, V37, P4241
[6]   DEEP-UV CHEMICALLY AMPLIFIED DISSOLUTION-INHIBITED PHOTORESISTS [J].
CRIVELLO, JV ;
SHIM, SY ;
SMITH, BW .
CHEMISTRY OF MATERIALS, 1994, 6 (11) :2167-2171
[7]   Photoinduced and thermally induced cationic polymerizations using dialkylphenacylsulfonium salts [J].
Crivello, JV ;
Kong, SQ .
MACROMOLECULES, 2000, 33 (03) :833-842
[8]   DYE-SENSITIZED PHOTOINITIATED CATIONIC POLYMERIZATION [J].
CRIVELLO, JV ;
LAM, JHW .
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1978, 16 (10) :2441-2451
[9]  
Crivello JV, 2001, J POLYM SCI POL CHEM, V39, P343
[10]   Excited-State Dynamics of a D-π-A Type Sulfonium-Based Alkoxystilbene Photoacid Generator [J].
De Waele, Vincent ;
Hamm, Maximilian ;
Vergote, Thomas ;
Chaumeil, Helene ;
Jin, Ming ;
Malval, Jean-Pierre ;
Baldeck, Patrice ;
Poizat, Olivier .
CHEMISTRY OF MATERIALS, 2015, 27 (05) :1684-1691