Charge-state distributions of metallic electron cyclotron resonance plasmas

被引:15
|
作者
Kumar, P. [1 ]
Rodrigues, G. [1 ]
Lakshmy, P. S. [1 ]
Kanjilal, D. [1 ]
Kumar, R. [2 ]
机构
[1] Inter Univ Accelerator Ctr, New Delhi 110067, India
[2] Ch Charan Singh Univ, Dept Phys, Meerut 250004, Uttar Pradesh, India
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2008年 / 26卷 / 01期
关键词
D O I
10.1116/1.2823486
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The authors have developed metallic ion beams in the energy range of a few keV to a few MeV using a low-energy ion-beam facility (LEIBF) consisting of a 10 GHz all-permanent-magnet electron cyclotron resonance (ECR) ion source placed on a high-voltage (200 kV) platform. The metallic vapors were achieved by plasma sputtering, using a micro-oven and volatile compounds to produce multiply charged ECR plasma. The ions were then extracted from the plasma and their energy and momentum were analyzed using a high-resolution dipole magnet. Charge-state distributions (CSDs) of three metallic ECR plasmas (Cu, Ni, and Sn) produced by different techniques are presented to help in using low-energy metallic ions for implantation. We present the CSD studies of metallic ECR plasma and highlight the physics of the process involved. (C) 2008 American Vacuum Society.
引用
收藏
页码:97 / 102
页数:6
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