A multilayer nucleation model for twinning during directional solidification of multi-crystalline silicon

被引:5
作者
Lin, H. K. [1 ]
Lan, C. W. [1 ]
机构
[1] Natl Taiwan Univ, Dept Chem Engn, Taipei 10617, Taiwan
关键词
Nucleation; Planar defects; Twinning; Multi-layer model; Semiconducting silicon; GROWTH; EVOLUTION; SI;
D O I
10.1016/j.jcrysgro.2017.08.024
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Twin nucleation is an important phenomenon in the directional solidification of photovoltaic multi-crystalline silicon. Unfortunately, the models proposed so far were not sufficient to explain the small undercooling (<1 K) for twinning observed in the experiments. In this paper, we propose a multilayer nucleation mechanism for twinning during silicon directional solidification. When the nucleus contains more than one layer, the free energy of formation for the nucleus can be reduced. As a result, the critical radius decreases and the twinning probability increases. The required undercooling for twinning based on the present model could be reduced to around 0.4-0.6 K, which is much more consistent with the experimental observations. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:47 / 51
页数:5
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