Plasma surface treatment of polyimide for adhesive Cu/80Ni20Cr/PI flexible copper clad laminate

被引:58
作者
Eom, Jun Sun [1 ]
Kim, Sang Ho [1 ]
机构
[1] Korea Univ Technol & Educ, Dept Mat Engn, Cheonan 330708, South Korea
关键词
FCCL; adhesion; RF magnetron sputtering; atmospheric plasma treatment; low pressure plasma treatment; polyimide;
D O I
10.1016/j.tsf.2008.01.022
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Two different methods of surface treatment, a low pressure plasma treatment and an atmospheric plasma treatment, on polyamide (PI) substrate were investigated from the point of view of adhesion of a Cu/80Ni20Cr layer on PI in flexible copper clad laminate (FCCL). The specimen treated with atmospheric plasma had high peel strength properties before and after aging. The root-mean-squared (rms) roughness with samples exposed to both kinds of plasma treatment was almost the same at 0.68 nm and 0.65 nm respectively, but the contact angle was different at 14.5 degrees and 5.9 degrees. We interpret this to mean that a more hydrophilic surface can be obtained using atmospheric plasma treatment. Observing the XPS spectra, more C-O binding rate was identified on the FCCL sample treated with the atmospheric plasma. From these results, it is suggested that the better adhesion achieved with atmospheric plasma treatment is not due to the mechanical roughness on the PI but due more to the activated C-O chemical bonding. (C) 2008 Elsevier B.V All rights reserved.
引用
收藏
页码:4530 / 4534
页数:5
相关论文
共 10 条
[1]  
[Anonymous], 2004, WEEKLY ELECT INFORM, V7, P1
[2]  
[Anonymous], IPCTM650
[3]   Low cost flex substrates for miniaturized electronic assemblies [J].
Barlow, F ;
Lostetter, A ;
Elshabini, A .
MICROELECTRONICS RELIABILITY, 2002, 42 (07) :1091-1099
[4]  
JO SS, 2003, J MICROELECTRONICS P, V10, P39
[5]  
Kim H. G., 1998, KOREAN I ELECT ELECT, V11, P340
[6]   Effect of surface roughness on the adhesion properties of Cu/Cr films on polyimide substrate treated by inductively coupled oxygen plasma [J].
Kim, SH ;
Na, SW ;
Lee, NE ;
Nam, YW ;
Kim, YH .
SURFACE & COATINGS TECHNOLOGY, 2005, 200 (07) :2072-2079
[7]   Material characterization of Cu(Ti)-polyimide thin film stacks [J].
Kondoh, E .
THIN SOLID FILMS, 2000, 359 (02) :255-260
[8]   Surface interaction of polyimide with oxygen ECR plasma [J].
Naddaf, M ;
Balasubramanian, C ;
Alegaonkar, PS ;
Bhoraskar, VN ;
Mandle, AB ;
Ganeshan, V ;
Bhoraskar, SV .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2004, 222 (1-2) :135-144
[9]  
PARK SJ, 2002, HWAHAK KONGHAK, V40, P613
[10]  
SATORU I, 1998, VACUUM, V51, P615