Performance and reliability comparison between asymmetric and symmetric LDD devices and logic gates

被引:18
作者
Chen, JF [1 ]
Tao, J
Fang, P
Hu, CM
机构
[1] Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA
[2] Adv Micro Devices Inc, Sunnyvale, CA 94088 USA
关键词
hot carriers; integrated circuit reliability; semiconductor device reliability;
D O I
10.1109/4.748188
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The performance and reliability of NMOSFET asymmetric lightly doped drain (LDD) devices (with no LDD on the source side) are compared with those of conventional LDD devices. At a fixed V-dd, asymmetric LDD devices exhibit higher I-dsat and shorter hot-carrier lifetime. To maintain the same hot-carrier lifetime, asymmetric LDD devices must operate at lower V-dd while higher I-dsat is retained. For the same hot-carrier lifetime, ring oscillators with NMOSFET asymmetric LDD devices can achieve 5% (10% if PMOSFET also had asymmetric LDD) higher speed and 10% lower power, The hot-carrier reliability of inverter, NAND, and NOR structures with asymmetric and conventional LDD devices is also simulated and compared.
引用
收藏
页码:367 / 371
页数:5
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