Recent developments in fluorine chemistry for microelectronic applications - Some examples at Comurhex

被引:10
|
作者
Jourdan, A [1 ]
Morel, B [1 ]
机构
[1] Comurhex, F-26701 Pierrelatte, France
关键词
fluorine; tungsten hexafluoride; chlorine trifluoride; microelectronic gases; cleaning; metallization;
D O I
10.1016/S0022-1139(00)00367-5
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
High purity fluorides are very important for microelectronic applications. In this article, we have reviewed how to prepare, handle and analyse such products as WF6 and ClF3, respectively, a tungsten precursor for metal interconnects and an efficient cleaning agent. Material choice and passivation coupled with high performance analytical studies are the key factors to maintain the highest required purity. This methodology can be extended to other reactive fluorochemicals. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
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页码:255 / 264
页数:10
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