Identification of a deposition rate profile subspace corresponding to spatially-uniform films in planetary CVD reactors: a new criterion for uniformity control

被引：5

作者：

Adomaitis, RA ^{[1
]}

机构：

[1] Univ Maryland, Dept Chem Engn, Syst Res Inst, College Pk, MD 20742 USA

来源：

COMPUTERS & CHEMICAL ENGINEERING | 2005年 / 29卷 / 04期

关键词：

spatially-uniform films; CVD reactor; uniformity control;

D O I：

10.1016/j.compchemeng.2004.09.020

中图分类号：

TP39 [计算机的应用];

学科分类号：

081203 ; 0835 ;

摘要：

A means of identifying a subspace in the space of all deposition profile functions is developed, where the subspace spans all spatially nonuniform deposition profiles that result in uniform profiles under rotation in radial-flow chemical vapor deposition systems with planetary wafer rotation. This model-independent uniformity criterion is used to optimize film thickness uniformity in a representative CVD system; its applicability to other film deposition system design and optimization problems is discussed. (c) 2004 Elsevier Ltd. All rights reserved.

引用

页码：829 / 837

页数：9

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