Effect of atmospheric pressure cold plasma (ACP) treatment on the technological characteristics of quinoa flour

Atmospheric pressure cold plasma (ACP) is considered as non-thermal treatment with potential microbial inactivation efficiencies. This study is aimed to determine the effect of ACP treatment on technological char-acteristics of quinoa flour using Fourier Transform Infrared Spectroscopy, flour hydration characteristics, ther-mal properties, rheological measurement and morphological characterization. Whole quinoa grains were subjected to a dielectric barrier discharge plasma reactor for 5 min at 50 kV, 10 min at 50 kV, 5 min at 60 kV and 10 min at 60 kV known as S1, S2, S3 and S4 respectively. Untreated sample is named as control sample. Results indicated the significant impact of ACP treatment on rheological, thermal, hydration and morphological char-acteristics of quinoa flour depending on the exposed time and voltage. For example, while a voltage dependent decrease (p < 0.05) has been found in enthalpy with values equal to 743.6 +/- 0.5, 1395 +/- 1, 635.6 +/- 0.6 and 804.3 +/- 0.9 J/g for S1, S2, S3 and S4 respectively, it is positively influenced by increasing the exposure time at constant voltage. Consequently, it seems that the influence of ACP treatment on technological characteristics which is mainly induced by time-and/or voltage-dependent changes in proteins and starch structures needs to be optimized regarding the desired behavior characteristics.