Electrostatic discharge (ESD);
Latch-up;
The lateral diffused metal-oxide semiconductor embedded in silicon controlled rectifier (LDMOS-SCR);
Holding current;
DUAL-DIRECTION SCR;
D O I:
10.1016/j.microrel.2016.01.016
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
We investigate a novel lateral diffused metal-oxide semiconductor (LDMOS) device embedded in silicon controlled rectifier (SCR) and resistance-capacitance circuit (LDMOS-SCR-RC). The internal RC-coupling effect helps to increase the holding current (I-h), resulting in the enhanced latch-up immunity of electrostatic discharge (ESD) protection device in high voltage integrated circuits (HV ICs). Transmission line pulse testing results show that the proposed LDMOS-SCR-RC has the largest I-h and smallest trigger voltage (V-t1), comparing to the conventional LDMOS-SCR and LDMOS-SCR embedded a resistance. When key parameters such as the gate-length and resistance are optimized, the I-h increases further from 1.1 A to 1.5 A, while the V-t1 changes insignificantly. The detailed internal mechanism of LDMOS-SCR-RC with regard to key parameters is analyzed numerically by the SENTAURUS simulation. Results confirm that the increased Ih is mainly due to the enhanced RC-coupling effect. Finally, DC measurements conducted with a semiconductor curve tracer also confirm that the LDMOS-SCR-RC with small device area is effective for avoiding latch-up risks. The optimized LDMOS-SCR-RC provides a useful latch-up immune ESD protection solution for HV ICs input/output ports. (C) 2016 Elsevier Ltd. All rights reserved.
机构:Xiangtan Univ, Fac Mat Optoelect & Phys, Xiangtan 411105, Hunan, Peoples R China
Wang, Yang
Jin, Xiangliang
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机构:
Xiangtan Univ, Fac Mat Optoelect & Phys, Xiangtan 411105, Hunan, Peoples R ChinaXiangtan Univ, Fac Mat Optoelect & Phys, Xiangtan 411105, Hunan, Peoples R China
Jin, Xiangliang
Yang, Liu
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机构:Xiangtan Univ, Fac Mat Optoelect & Phys, Xiangtan 411105, Hunan, Peoples R China
Yang, Liu
Jiang, Qi
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机构:Xiangtan Univ, Fac Mat Optoelect & Phys, Xiangtan 411105, Hunan, Peoples R China
Jiang, Qi
Yuan, Huihui
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机构:Xiangtan Univ, Fac Mat Optoelect & Phys, Xiangtan 411105, Hunan, Peoples R China
机构:
Key Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University
ESD Laboratory, Department of Information Science and Electronic Engineering, Zhejiang UniversityKey Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University
梁海莲
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董树荣
顾晓峰
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Key Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan UniversityKey Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University
顾晓峰
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钟雷
吴健
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机构:
ESD Laboratory, Department of Information Science and Electronic Engineering, Zhejiang UniversityKey Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University
吴健
于宗光
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Key Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University
China Electronic Technology Group Corporation, No ResearchKey Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University
机构:
State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of ChinaState Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of China
乔明
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何逸涛
张波
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State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of ChinaState Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of China