Peracids - New oxidants in advanced oxidation processes: The use of peracetic acid, peroxymonosulfate, and persulfate salts in the removal of organic micropollutants of emerging concern - A review

In recent years, there has been increasing interest in using of advanced oxidation processes in water and wastewater decontamination. As a new oxidants peracids, mainly peracetic acid (PAA) and peracid salts, i.e. peroxymonosulfate (PMS) and persulfate (PS) are used. The degradation process of organic compounds takes place with the participa-tion of radicals, including hydroxyl (center dot OH) and sulfate (SO4 center dot-) radicals derived from the peracids activation processes. Peracids can be activated in homogeneous systems (UV radiation, d-electron metal ions, e.g. Fe2+, Co2+, Mn2+, base, ozonolysis, thermolysis, radiolysis), or using heterogeneous activation (metals with zero oxidation state, metal oxides, quinones, activated carbon, semiconductors). As a result of oxidation, products of a lower mass than the par-ent compounds, less toxic, and more susceptible to biodegradation are formed. An important task is to investigate the effect of the peracid activation method and matrix composition on the efficiency of contamination removal. The article presents the latest information about the application of peracids in the removal of organic micropollutants of emerging concern (mainly focuses on endocrine disrupted compounds). The most important in-formation on peracetic acid, peroxymonosulfate and persulfate salts, and methods of their activation are presented. Current uses of these oxidants in organic micropollutants removal are also described. Information was collected on the factors influencing the oxidation process and the effectiveness of pollutant removal. This paper compares PAA, PMS and PS-based processes for the first time in terms of kinetics and efficiency. (c) 2021 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/). <comment>Superscript/Subscript Available</comment