Highly corrosion resistant stainless steel with Si implanted/deposited phase

被引：16

作者：

Nishimura, R

Yamakawa, K

Ishiga, J

Matsumoto, Y

Nagano, H

机构：

[1] Univ Osaka Prefecture, Dept Appl Mat Sci, Sakai, Osaka 593, Japan

[2] Sumitomo Met Ind Ltd, Corp Res & Dev Lab, Amagasaki, Hyogo 660, Japan

[3] Ion Engn Res Inst, Hirakata, Osaka 57301, Japan

来源：

MATERIALS CHEMISTRY AND PHYSICS | 1998年 / 54卷 / 1-3期

关键词：

ion implantation; deposition; silicon; corrosion resistance;

D O I：

10.1016/S0254-0584(98)00104-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

To develop a low price stainless steel with high corrosion resistance, the corrosion behavior of SUS430 stainless steel modified by using both ion implantation (Si) and deposition (Si and TiO2) techniques has been investigated in chloride solutions. From the behavior of the polarization curve, pitting corrosion and crevice corrosion, the surface modification was found to lead to the formation of the passive film on the modified steels, with remarkable corrosion resistance, especially for pitting and crevice corrosions, in comparison with the base metal of SUS430. Therefore, the corrosion resistance of SUS430 in chloride solutions is confirmed to be largely enhanced by the surface modification using Si implantation and TiO2 deposition techniques. (C) 1998 Elsevier Science S.A. All rights reserved.

引用

页码：289 / 292

页数：4

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