Optical and thermal performance of nitride-based thin-film flip-chip light-emitting diodes

被引:1
作者
Liu, Wen-Jie [1 ]
Hu, Xiao-Long [2 ]
Liu, Yi-Jun [1 ]
机构
[1] Guangdong Univ Technol, Sch Informat Engn, Guangzhou 510006, Guangdong, Peoples R China
[2] South China Univ Technol, Sch Phys & Optoelect, Guangzhou 510640, Guangdong, Peoples R China
基金
中国国家自然科学基金;
关键词
EXTRACTION EFFICIENCY; LOW-TEMPERATURE; FABRICATION; GRAPHENE; CONTACT; LAYER;
D O I
10.1007/s10854-018-0110-1
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Nitride-based light-emitting diodes (LEDs) were fabricated based on initial patterned sapphire substrate by thin film (TF) and flip-chip (FC) techniques. An enhancement of 7.7% in light output power was first obtained by optimizing the p-type contact layer. Then, periodic patterned surface was optimized by wet etchingafter removal of the sapphire substrate, and the light output power of the TFFC-LEDs was enhanced by 19.8% as compared to that of the TFFC-LEDs with original patterned surface. The device performance characteristic including illuminant pattern, emission wavelength movement and junction temperature variation of the optimized TFFC-LEDs were shown as compared with commercialized LEDs. The results indicate that the TFFC-LEDs possess uniform current distribution and lower junction temperature, thus show promising applications in various areas such as automotive lighting, illegal capture and solid-state lighting.
引用
收藏
页码:19825 / 19829
页数:5
相关论文
共 32 条
[1]   Formation process of high reflective Ni/Ag/Au Ohmic contact for GaN flip-chip light-emitting diodes [J].
Chang, Liann-Be ;
Shiue, Ching-Chuan ;
Jeng, Ming-Jer .
APPLIED PHYSICS LETTERS, 2007, 90 (16)
[2]   Improvement of Ni nonalloyed ohmic contacts on p-GaN films by changing thickness of p-InGaN capping layers [J].
Chu, Yow-Lin ;
Lin, Yow-Jon ;
Ho, Cheng-Hsiang ;
Chen, Wei-Li .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (9A) :6884-6887
[3]   The Effect of Growth Pressure and Growth Rate on the Properties of Mg-Doped GaN [J].
Fu, Binglei ;
Liu, Naixin ;
Zhang, Ning ;
Si, Zhao ;
Wei, Xuecheng ;
Wang, Xiaodong ;
Lu, Hongxi ;
Liu, Zhe ;
Wei, Tongbo ;
Yi, Xiaoyan ;
Li, Jinmin ;
Wang, Junxi .
JOURNAL OF ELECTRONIC MATERIALS, 2014, 43 (04) :1244-1248
[4]   Increase in the extraction efficiency of GaN-based light-emitting diodes via surface roughening [J].
Fujii, T ;
Gao, Y ;
Sharma, R ;
Hu, EL ;
DenBaars, SP ;
Nakamura, S .
APPLIED PHYSICS LETTERS, 2004, 84 (06) :855-857
[5]   Current crowding in GaN/InGaN light emitting diodes on insulating substrates [J].
Guo, X ;
Schubert, EF .
JOURNAL OF APPLIED PHYSICS, 2001, 90 (08) :4191-4195
[6]   Optimizing n-type contact design and chip size for high-performance indium gallium nitride/gallium nitride-based thin-film vertical light-emitting diode [J].
Han, Jaecheon ;
Lee, Daehee ;
Jin, Boram ;
Jeong, Hwanhee ;
Song, June-O ;
Seong, Tae-Yeon .
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2015, 31 :153-159
[7]   Performance of Flip-Chip Thin-Film GaN Light-Emitting Diodes With and Without Patterned Sapphires [J].
Horng, Ray-Hua ;
Hu, Hung-Lieh ;
Chu, Mu-Tao ;
Tsai, Yu-Li ;
Tsai, Yao-Jun ;
Hsu, Chen-Peng ;
Wuu, Dong-Sing .
IEEE PHOTONICS TECHNOLOGY LETTERS, 2010, 22 (08) :550-552
[8]   High-luminous efficacy white light-emitting diodes with thin-film flip-chip technology and surface roughening scheme [J].
Hu, Xiao-Long ;
Zhang, Jing ;
Wang, Hong ;
Zhang, Xi-Chun .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2016, 49 (44)
[9]   Low-resistance and thermally stable indium tin oxide Ohmic contacts on strained p-In0.15Ga0.85N/p-GaN layer [J].
Jang, Ja-Soon ;
Seong, Tae-Yeon .
JOURNAL OF APPLIED PHYSICS, 2007, 101 (01)
[10]   Formation of low-resistance Ohmic contacts to N-face n-GaN for high-power GaN-based vertical light-emitting diodes [J].
Jeon, Joon-Woo ;
Park, Seong-Han ;
Jung, Se-Yeon ;
Lee, Sang Youl ;
Moon, Jihyung ;
Song, June-O ;
Seong, Tae-Yeon .
APPLIED PHYSICS LETTERS, 2010, 97 (09)