Laser spectroscopy of silicon nanostructures

被引:0
|
作者
Kanemitsu, Y [1 ]
机构
[1] Nara Inst Sci & Technol, Grad Sch Mat Sci, Nara 63001, Japan
来源
ALT '97 INTERNATIONAL CONFERENCE ON LASER SURFACE PROCESSING | 1998年 / 3404卷
关键词
luminescence; Si nanostructures; exciton localization; quantum confinement; surface state;
D O I
10.1117/12.308636
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We discuss the mechanism of efficient photoluminescence (PL) from Si nanocrystals. Luminescence properties of SiO2-capped Si nanocrystals are different from those of H-passivated Si nanocrystals. The size-dependence of PL properties and resonantly excited PL spectra of SiO2-capped Si nanocrystals indicate that excitons are localized at the interface between c-Si and SiO2 surface layer. The TO-phonon related structure in resonantly excited luminescence is clearly observed in H-passivated Si nanocrystals. H-passivated Si nanocrystals show their crystalline nature, while the oxidized Si nanocrystals show their disorder nature. The luminescence properties of Si nanocrystals are discussed.
引用
收藏
页码:331 / 340
页数:10
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