Reactive Sintering of Copper Nanoparticles Using Intense Pulsed Light for Printed Electronics

被引:235
作者
Ryu, Jongeun [1 ]
Kim, Hak-Sung [2 ]
Hahn, H. Thomas [1 ,3 ]
机构
[1] Univ Calif Los Angeles, Dept Aerosp Engn & Mech, Los Angeles, CA 90095 USA
[2] Hanyang Univ, Dept Mech Engn, Seoul 133791, South Korea
[3] Korea Inst Sci & Technol, Seoul 136791, South Korea
关键词
Intense pulsed light; reactive sintering; copper oxide; printed electronics; CU NANOPARTICLES; REDUCTION; PYRROLIDONE); POWDER;
D O I
10.1007/s11664-010-1384-0
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Most commercial copper nanoparticles are covered with an oxide shell and cannot be sintered into conducting lines/films by conventional thermal sintering. To address this issue, past efforts have utilized complex reduction schemes and sophisticated chambers to prevent oxidation, thereby rendering the process cost ineffective. To alleviate these problems, we demonstrate a reactive sintering process using intense pulsed light (IPL) in the present study. The IPL process successfully removed the oxide shells of copper nanoparticles, leaving a conductive, pure copper film in a short period of time (2 ms) under ambient conditions. The in situ copper oxide reduction mechanism was studied using several different experiments and analyses. We observed instant copper oxide reduction and sintering through poly(N-vinylpyrrolidone) functionalization of copper nanoparticles, followed by IPL irradiation. This phenomenon may be explained by oxide reduction either via an intermediate acid created by ultraviolet (UV) light irradiation or by hydroxyl (-OH) end groups, which act like long-chain alcohol reductants.
引用
收藏
页码:42 / 50
页数:9
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