Low-Loss Ka-band SPDT Switch Design Methodology for 5G Applications in 65 nm CMOS SOI Technology

被引:0
|
作者
Despoisse, Thibaut [1 ,2 ]
Deltimple, Nathalie [2 ]
Ghiotto, Anthony [2 ]
De Matos, Magali [2 ]
Busson, Pierre [1 ]
机构
[1] STMicroelect, Crolles, France
[2] Univ Bordeaux, Bordeaux INP, UMR CNRS 5218, IMS Lab, Talence, France
来源
2020 IEEE 20TH TOPICAL MEETING ON SILICON MONOLITHIC INTEGRATED CIRCUITS IN RF SYSTEMS (SIRF) | 2020年
关键词
5G; CMOS; FEM; Ka-band; SOI; SPDT;
D O I
10.1109/sirf46766.2020.9040177
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a design methodology for front end module SPDT switches. Then it is applied to an advanced CMOS SOI circuit for Ka-band 5G mobile communications. Firstly the specifications are discussed to address the targeted use case. The chosen technology, offering a simulated FoM of 110 fs, is introduced. Then, the easily scalable non technology dependent design methodology is presented. Measurement results of a series-shunt switch demonstrator are reported for methodology validation. The fabricated SPDT achieves insertion losses lower than 1 dB and an isolation above 20 dB in the 24-31 GHz frequency range. The measured performances are comparable to other recently reported SPDT based on advanced CMOS technologies.
引用
收藏
页码:5 / 8
页数:4
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