PREPARATION AND CHARACTERISATION OF EXFOLIATED GRAPHENE FOR QUANTUM RESISTANCE METROLOGY

被引：0
|
作者：
Rietveld, G. [1 ]
van Elferen, H. J. [2 ]
Giesbers, A. J. M. [2 ]
Veligura, A. [4 ]
Zeitler, U. [2 ]
Novoselov, K. S. [3 ]
van Wees, B. J. [4 ]
Geim, A. K. [3 ]
Maan, J. C. [2 ]
机构：
[1] VSL, Delft, Netherlands
[2] HFML, Nijmegen, Netherlands
[3] Univ Manchester, Dept Phys, Manchester M13 9PL, Lancs, England
[4] Univ Groningen, Phys Nanodevices, Groningen, Netherlands
来源：
2010 CONFERENCE ON PRECISION ELECTROMAGNETIC MEASUREMENTS CPEM | 2010年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Exfoliated graphene samples have been prepared for use in quantum resistance metrology. Good progress is recently made in achieving contact resistances to graphene of less than 50 Omega. Details are presented on the handling and measurement of graphene samples.
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页码：627 / +
页数：2
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