Probing the internal structures of Kevlar® fibers and their impacts on mechanical performance

被引:49
作者
Roenbeck, Michael R. [1 ]
Sandoz-Rosado, Emil J. [1 ]
Cline, Julia [1 ]
Wu, Vincent [1 ]
Moy, Paul [1 ]
Afshari, Mehdi [2 ]
Reichert, David [2 ]
Lustig, Steven R. [3 ]
Strawhecker, Kenneth E. [1 ]
机构
[1] US Army, Res Lab, 4600 Deer Creek Loop, Aberdeen Proving Ground, MD 21005 USA
[2] EI du Pont Nemours & Co, DuPont Protect Solut, Richmond, VA USA
[3] Northeastern Univ, Dept Chem Engn, 360 Huntington Ave, Boston, MA 02115 USA
关键词
Kevlar (R); High-performance fibers; Internal structure; Processing-structure-property relationships; Atomic force microscopy; Multifrequency mapping; POLY(P-PHENYLENE TEREPHTHALAMIDE) FIBERS; X-RAY-DIFFRACTION; TENSILE DEFORMATION; MORPHOLOGY; MODULUS; BEHAVIOR; FAILURE;
D O I
10.1016/j.polymer.2017.09.039
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Advancements in processing techniques have facilitated the development of a series of unique high-performance DuPont (TM) Kevlar (R) fibers. Directly characterizing interior structures of these fibers is vital for connecting processing variations with resulting mechanical properties. Here we report detailed investigations of processing-internal structure-property relationships among four distinct classes of Kevlar (R) fibers (K119, K29, KM2+, and K49). We employ a novel focused ion beam (FIB) notch technique to obtain pristine interior fiber planes and measure morphology and transverse stiffness across these surfaces via multifrequency atomic force microscopy (AFM) maps. Combining these observations with tensile tests of single fibers drawn from the same tows, we acquire remarkable insights into structural motifs that strongly correlate with measured mechanical properties. Most notably, we uncover alternating stiffness bands that are especially apparent in low-modulus, non-heat-treated fibers, revealing a unique manifestation of internal structural variations that helps explain the observed trends in material response. Published by Elsevier Ltd.
引用
收藏
页码:200 / 210
页数:11
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