Analysis of the effect of annealing on the photoluminescence spectra of Cu+ ion implanted ZnS nanoparticles

被引:23
作者
Kumar, S. Saravana [2 ]
Khadar, M. Abdul [1 ,2 ]
Nair, K. G. M. [3 ]
机构
[1] Univ Kerala, Ctr Nanosci & Nanotechnol, Thiruvananthapuram 695581, Kerala, India
[2] Univ Kerala, Dept Phys, Thiruvananthapuram 695581, Kerala, India
[3] Indira Gandhi Ctr Atom Res, Div Mat Sci, Kalpakkam 603102, Tamil Nadu, India
关键词
Ion implantation; ZnS nanoparticles; Photoluminescence; Annealing; OPTICAL-PROPERTIES; PHOTOPHYSICAL PROPERTIES; LUMINESCENCE PROPERTIES; DOPED NANOCRYSTALS; TEMPERATURE; DEFECTS;
D O I
10.1016/j.jlumin.2010.12.004
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In the present study, we report the photoluminescence (PL) study of nanoparticles of ZnS implanted with Cu+ ions at the doses of 5 x 10(14), 1 x 10(15) and 5 x 10(15) ions/cm(2) and annealed at 200 and 300 degrees C. The photoluminescence spectra of the samples implanted at lower doses of 5 x 10(14) and 1 x 10(15) ions/cm(2) and annealed at 200 and 300 degrees C showed peaks at around 406, 418 and 485 nm. The PL emission peak at 485 nm was attributed to the transition of electrons from conduction band of ZnS to the impurity level formed by the implanted Cu+ ions. In the PL spectrum of the sample implanted at the highest dose of 5 x 10(15) ions/cm(2), in addition to the emission peaks observed in the PL spectra of the samples implanted at lower doses, a peak at around 525 nm, the intensity of which decreased with increase in the annealing temperature, was observed. The emission peak at 525 nm was attributed to the transitions between sulfur and zinc vacancy levels. The full width at half maximum (FWHM) of the emission peak at 406 nm was observed to decrease with increase in annealing temperature, indicating lattice reconstruction. The observation of copper ion impurity related peak at 485 nm in the PL spectra of samples of the present study indicated that the doping of copper ions into the ZnS lattice is achievable by implanting Cu+ ions followed by annealing. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:786 / 789
页数:4
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