Characteristics of ZrC/ZrN and ZrC/TiN multilayers grown by pulsed laser deposition

被引：31
作者：
Craciun, D. [1 ]
Bourne, G. [2 ]
Socol, G. [1 ]
Stefan, N. [1 ]
Dorcioman, G. [1 ]
Lambers, E. [2 ]
Craciun, V. [1 ,2 ]
机构：
[1] Natl Inst Laser Plasma & Radiat Phys, Laser Dept, Bucharest, Romania
[2] Univ Florida, Major Analyt Instrumentat Ctr, Gainesville, FL 32611 USA
来源：
APPLIED SURFACE SCIENCE | 2011年 / 257卷 / 12期
关键词：
ZrC; ZrN; TiN; Pulsed laser deposition; Thin films; Multilayers; ZRC THIN-FILMS; X-RAYS; COATINGS; HARDNESS; CARBIDE; MICROSTRUCTURE; ROUTES; ARRAYS; TIN;
D O I：
10.1016/j.apsusc.2010.11.106
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
ZrC/ZrN and ZrC/TiN multilayers were grown on (100) Si substrates at 300 degrees C by the pulsed laser deposition (PLD) technique using a KrF excimer laser. X-ray diffraction investigations showed that films were crystalline, the strain and grain size depending on the nature and pressure of the gas used during deposition. The elemental composition, analyzed by Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS), showed that films contained a low level of oxygen contamination. Simulations of the X-ray reflectivity (XRR) curves acquired from films indicated a smooth surface morphology, with roughness below 1 nm (rms) and densities very close to bulk values. Nanoindentation results showed that the ZrC/ZrN and ZrC/TiN multilayer samples exhibited hardness values between 30 and 33 GPa, slightly higher than the values of 28-30 GPa measured for pure ZrC, TiN and ZrN films. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码：5332 / 5336
页数：5
相关论文
共 32 条
  • [1] Nanoindentation hardness and structure of ion beam sputtered TiN, W and TiN/W multilayer hard coatings
    Abadias, G.
    Dub, S.
    Shmegera, R.
    [J]. SURFACE & COATINGS TECHNOLOGY, 2006, 200 (22-23) : 6538 - 6543
  • [2] Investigation of interface properties of sputter deposited TiN/CrN superlattices by low angle x-ray reflectivity
    Barshilia, Harish C.
    Selvakumar, N.
    Rajam, K. S.
    Gopinadhan, K.
    Chaudhary, Sujeet
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2008, 41 (20)
  • [3] TiN/ZrN heterostructures deposition and characterisation
    Braic, M.
    Balaceanu, M.
    Vladescu, A.
    Kiss, A.
    Braic, V.
    Purice, A.
    Dinescu, G.
    Scarisoreanu, N.
    Stokker-Cheregi, F.
    Moldovan, A.
    Birjega, R.
    Dinescu, M.
    [J]. SURFACE & COATINGS TECHNOLOGY, 2006, 200 (22-23) : 6505 - 6510
  • [4] Robust high current field emitter tips and arrays for vacuum microelectronics devices
    Charbonnier, FM
    Mackie, WA
    Hartman, RL
    Xie, TB
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (03): : 1064 - 1072
  • [5] The spectral emittance and long-term thermal stability of coatings for thermophotovoltaic (TPV) radiator applications
    Cockeram, BV
    Hollenbeck, JL
    [J]. SURFACE & COATINGS TECHNOLOGY, 2002, 157 (2-3) : 274 - 281
  • [6] Craciun D, 2010, J OPTOELECTRON ADV M, V12, P461
  • [7] High-repetition rate pulsed laser deposition of ZrC thin films
    Craciun, D.
    Socol, G.
    Stefan, N.
    Mihailescu, I. N.
    Bourne, G.
    Craciun, V.
    [J]. SURFACE & COATINGS TECHNOLOGY, 2009, 203 (08) : 1055 - 1058
  • [8] Pulsed laser deposition of crystalline ZrC thin films
    Craciun, V.
    Craciun, D.
    Howard, J. M.
    Woo, J.
    [J]. THIN SOLID FILMS, 2007, 515 (11) : 4636 - 4639
  • [9] REACTIVE PULSED LASER DEPOSITION OF THIN TIN FILMS
    CRACIUN, V
    CRACIUN, D
    BOYD, IW
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1993, 18 (02): : 178 - 180
  • [10] Zirconium carbide thin films deposited by pulsed laser ablation
    D'Alessio, L
    Santagata, A
    Teghil, R
    Zaccagnino, M
    Zaccardo, I
    Marotta, V
    Ferro, D
    De Maria, G
    [J]. APPLIED SURFACE SCIENCE, 2000, 168 (1-4) : 284 - 287
1234