Effects of deposition method on the microstructure and intermetallic compound formation in Ag-Sn bilayers

被引:7
作者
Rossi, P. [1 ]
Zotov, N. [1 ]
Mittemeijer, E. J. [1 ,2 ]
机构
[1] Max Planck Inst Intelligent Syst, D-70569 Stuttgart, Germany
[2] Univ Stuttgart, Inst Mat Sci, D-70569 Stuttgart, Germany
关键词
Evaporation; Magnetron sputtering; Ag-Sn bilayers; Surface energy; SILVER; GROWTH; TEMPERATURE; SURFACE; NANOPARTICLES; NUCLEATION; MECHANISM; SOLDER; FILMS;
D O I
10.1016/j.surfcoat.2015.10.057
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Thermal evaporation and magnetron sputtering were used for the deposition of bilayers of Ag and Sn with different stacking sequences of the sublayers, Ag on Sn (Ag/Sn) or Sn on Ag (Sn/Ag). The deposition method used significantly affects the intermetallic compound (IMC) formation in these thin films already during film deposition. Comparison of the corresponding microstructures and textures indicates that the observed, striking differences in IMC formation for the case of Ag/Sn bilayers can be related to the interplay of Sn upward diffusion, surface energy and interfacial intermixing for the two deposition methods. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:88 / 92
页数:5
相关论文
共 42 条
[1]   X-RAY DIFFRACTION STUDY OF EFFECTS OF SOLUTES ON OCCURRENCE OF STACKING FAULTS IN SILVER-BASE ALLOYS [J].
ADLER, RPI ;
WAGNER, CNJ .
JOURNAL OF APPLIED PHYSICS, 1962, 33 (12) :3451-&
[2]  
ALCOCK CB, 1984, CAN METALL QUART, V23, P309
[3]   Modeling evaporation, ion-beam assist, and magnetron sputtering of thin metal films over realistic time scales [J].
Blackwell, S. ;
Smith, R. ;
Kenny, S. D. ;
Walls, J. M. .
PHYSICAL REVIEW B, 2012, 86 (03)
[4]   GROWTH OF SPUTTERED VS EVAPORATED METAL FILMS [J].
CHOPRA, KL .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (09) :3405-&
[5]  
de Boer F. R., 1988, COHESION METALS, P163
[6]   CRYSTAL-STRUCTURES OF 2 COMPOUNDS FOUND IN DENTAL AMALGAM - AG2HG3 AND AG3SN [J].
FAIRHURST, CW ;
COHEN, JB .
ACTA CRYSTALLOGRAPHICA SECTION B-STRUCTURAL CRYSTALLOGRAPHY AND CRYSTAL CHEMISTRY, 1972, B 28 (FEB15) :371-+
[7]   Effect of adatom surface diffusivity on microstructure and intrinsic stress evolutions during Ag film growth [J].
Flototto, D. ;
Wang, Z. M. ;
Jeurgens, L. P. H. ;
Bischoff, E. ;
Mittemeijer, E. J. .
JOURNAL OF APPLIED PHYSICS, 2012, 112 (04)
[8]  
Fowler R., 1965, STAT THERMODYNAMICS, P124
[9]  
GALLAGHER PC, 1970, METALL TRANS, V1, P2429
[10]   VACUUM-DEPOSITED GOLD-FILMS .1. FACTORS AFFECTING THE FILM MORPHOLOGY [J].
GOLAN, Y ;
MARGULIS, L ;
RUBINSTEIN, I .
SURFACE SCIENCE, 1992, 264 (03) :312-326