Magnetic debris mitigation of a CO2 laser-produced Sn plasma

被引：15

作者：

Ueno, Yoshifumi ^{[1
]}

Soumagne, Georg ^{[1
]}

Moriya, Masato ^{[1
]}

Suganuma, Takashi ^{[1
]}

Abe, Tamotsu ^{[1
]}

Komori, Hiroshi ^{[1
]}

Endo, Akira ^{[1
]}

Sumitani, Akira ^{[1
]}

机构：

[1] EUVA Extreme Ultroviolet Lithog Syst Dev Assoc, Kanagawa 2548567, Japan

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES XII, PTS 1 AND 2 | 2008年 / 6921卷

关键词：

Extreme Ultraviolet Lithography; laser produced plasma; CO2; laser; Sn; debris; magnetic field;

D O I：

10.1117/12.771817

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We evaluated the characteristics of Sn debris generated by a CO2 laser (10.6 mu m) produced plasma. Experiments were performed with bulk Sn-plate targets and Mo/Si multilayer mirror samples were used for debris analysis. We observed very thin and uniform Sn layers of nano/sub-nano size debris particles. The layer deposition rate at 120mm from the plasma is, without magnetic field, about 30mn per million shots. The fundamental magnetic field effect has been confirmed experimentally. The fast Sn ion flux was measured with Faraday cups and the signal decreased by more than 3 orders of magnitude applying a magnetic field of IT. The Sn deposition on the Mo/Si multilayer mirror decreased in this case by a factor of 4. The contribution of the remaining neutral Sn particles is under study in order to decrease the deposition rate.

引用

页码：Z9212 / Z9212

页数：10

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