Modeling of reactive sputtering of hot titanium target in nitrogen and oxygen

被引：6

作者：

Goncharov, A. O. ^{[1
]}

Minzhulina, E. A. ^{[1
]}

Shapovalov, V. I. ^{[1
]}

机构：

[1] St Petersburg State Electrotech Univ LETI, St Petersburg, Russia

来源：

25TH INTERNATIONAL CONFERENCE ON VACUUM TECHNIQUE AND TECHNOLOGY | 2018年 / 387卷

基金：

俄罗斯基础研究基金会;

关键词：

PHYSICOCHEMICAL MODEL;

D O I：

10.1088/1757-899X/387/1/012020

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A model for reactive sputtering of a hot titanium target in the environment of oxygen and nitrogen is considered. The target temperature is defined as a function of the ion current density. For the mathematical description of the process, the basic postulate of chemical kinetics including the equation of the Langmuir isotherm and the Arrhenius equation under nonisothermal conditions is used. In addition, the model takes into account thermionic emission and evaporation of the target surface.

引用

页数：4