Modeling of reactive sputtering of hot titanium target in nitrogen and oxygen

被引：6
|
作者：
Goncharov, A. O. [1 ]
Minzhulina, E. A. [1 ]
Shapovalov, V. I. [1 ]
机构：
[1] St Petersburg State Electrotech Univ LETI, St Petersburg, Russia
来源：
25TH INTERNATIONAL CONFERENCE ON VACUUM TECHNIQUE AND TECHNOLOGY | 2018年 / 387卷
基金：
俄罗斯基础研究基金会;
关键词：
PHYSICOCHEMICAL MODEL;
D O I：
10.1088/1757-899X/387/1/012020
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A model for reactive sputtering of a hot titanium target in the environment of oxygen and nitrogen is considered. The target temperature is defined as a function of the ion current density. For the mathematical description of the process, the basic postulate of chemical kinetics including the equation of the Langmuir isotherm and the Arrhenius equation under nonisothermal conditions is used. In addition, the model takes into account thermionic emission and evaporation of the target surface.
引用
收藏
页数：4
相关论文
共 50 条
  • [1] Reactive magnetron sputtering of hot titanium target in mixture of argon and nitrogen
    Shapovalov, V., I
    Minzhulina, E. A.
    Shestakov, D. S.
    Kochin, A., V
    14TH INTERNATIONAL CONFERENCE ON FILMS AND COATINGS, 2019, 1281
  • [2] Thermal processes during reactive sputtering of hot titanium target
    Minzhulina, E. A.
    Shapovalov, V. I.
    Smirnov, V. V.
    Zav'aylov, A. V.
    Levitskiy, V. S.
    13TH INTERNATIONAL CONFERENCE ON FILMS AND COATINGS, 2017, 857
  • [3] Target poisoning during reactive sputtering of silicon with oxygen and nitrogen
    Waite, M. M.
    Shah, S. Ismat
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2007, 140 (1-2): : 64 - 68
  • [4] Coefficient of friction of titanium oxynitride films deposited by hot target reactive sputtering
    Shestakov, D. S.
    Useinov, A. S.
    Kravchuk, K. S.
    Gladkikh, E. V.
    Zavyalov, A. V.
    Morozova, A. A.
    Smirnov, V. V.
    25TH INTERNATIONAL CONFERENCE ON VACUUM TECHNIQUE AND TECHNOLOGY, 2018, 387
  • [5] Modelling of hot target reactive sputtering
    Shapovalov, V. I.
    Smirnov, V. V.
    13TH INTERNATIONAL CONFERENCE ON FILMS AND COATINGS, 2017, 857
  • [6] MODELING OF REACTIVE SPUTTERING OF TITANIUM BORIDE
    LARSSON, T
    BERG, S
    BLOM, HO
    THIN SOLID FILMS, 1989, 172 (02) : 241 - 249
  • [7] Pulsed power magnetron sputtering of a niobium target in reactive oxygen and/or nitrogen atmosphere
    Fenker, M
    Kappl, H
    Petrikowski, K
    Bretzler, R
    SURFACE & COATINGS TECHNOLOGY, 2005, 200 (5-6): : 1356 - 1360
  • [8] Physicochemical model for reactive sputtering of hot target
    Shapovalov, Viktor I.
    Karzin, Vitaliy V.
    Bondarenko, Anastasia S.
    PHYSICS LETTERS A, 2017, 381 (05) : 472 - 475
  • [9] EFFECT OF TARGET OXIDATION ON REACTIVE SPUTTERING RATES OF TITANIUM IN ARGON-OXYGEN PLASMAS
    DONAGHEY, LF
    GERAGHTY, KG
    THIN SOLID FILMS, 1976, 38 (03) : 271 - 280
  • [10] Characteristics of magnetron sputtering of hot titanium target in argon
    Minzhulina, E. A.
    Shapovalov, V., I
    Shestakov, D. S.
    Rudakov, A., V
    14TH INTERNATIONAL CONFERENCE ON FILMS AND COATINGS, 2019, 1281
12345