Fermi velocity engineering in graphene by substrate modification

被引:357
作者
Hwang, Choongyu [1 ]
Siegel, David A. [1 ,2 ]
Mo, Sung-Kwan
Regan, William [1 ,2 ]
Ismach, Ariel [3 ]
Zhang, Yuegang [3 ]
Zettl, Alex [1 ,2 ]
Lanzara, Alessandra [1 ,2 ]
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Div Mat Sci, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA
[3] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Mol Foundry, Berkeley, CA 94720 USA
关键词
MASSLESS DIRAC FERMIONS; RENORMALIZATION;
D O I
10.1038/srep00590
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
The Fermi velocity, v(F), is one of the key concepts in the study of a material, as it bears information on a variety of fundamental properties. Upon increasing demand on the device applications, graphene is viewed as a prototypical system for engineering v(F). Indeed, several efforts have succeeded in modifying v(F) by varying charge carrier concentration, n. Here we present a powerful but simple new way to engineer v(F) while holding n constant. We find that when the environment embedding graphene is modified, the v(F) of graphene is (i) inversely proportional to its dielectric constant, reaching v(F) similar to 2.5 x 10(6) m/s, the highest value for graphene on any substrate studied so far and (ii) clearly distinguished from an ordinary Fermi liquid. The method demonstrated here provides a new route toward Fermi velocity engineering in a variety of two-dimensional electron systems including topological insulators.
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页数:4
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