Influence of discharge gap on the discharge stability in a short vacuum arc ion source

被引：2

作者：

Chen, L. ^{[1
,2
]}

Zhang, G. L. ^{[1
]}

Jin, D. Z. ^{[1
]}

Yang, L. ^{[3
]}

Dai, J. Y. ^{[1
]}

机构：

[1] China Acad Engn Phys, Inst Elect Engn, Mianyang 621900, Sichuan, Peoples R China

[2] Tsinghua Univ, Dept Engn Phys, Beijing 100084, Peoples R China

[3] Louzhou Univ, Inst Nucl Sci & Technol, Lanzhou 730000, Gansu, Peoples R China

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 2012年 / 83卷 / 02期

关键词：

Vacuum applications - Vacuum technology - Cathodes - Ion sources;

D O I：

10.1063/1.3673008

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The influence of the discharge gap between cathode and anode on the discharge stability in a short vacuum arc (SVA) ion source is presented in this paper. Planar cathode and cylindrical hollow anode made of titanium are investigated. There is a great need in present accelerator injection research for SVA source to produce the small deviation of the ion current beam. Current research shows that increasing the short discharge gap can reduce the level of ion current deviation and ion charge deviation from 29% and 31% to 15% and 17%, respectively. A microplasma plume generation mechanism in SVA and scanning electron microscopic results can be used to explain this interesting phenomenon. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3673008]

引用

页数：3