Nanoscale MOSFET as a Potential Room-Temperature Quantum Current Source

被引:8
作者
Cheung, Kin P. [1 ]
Wang, Chen [2 ]
Campbell, Jason P. [1 ]
机构
[1] NIST, Nanoscale Device Characterizat Div, Gaithersburg, MD 20899 USA
[2] Fudan Univ, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China
关键词
nanoscale; mosfet; quantum current; INDIVIDUAL INTERFACE TRAPS; SI/SIO2; INTERFACE; BAND-GAP; ELECTRON; CENTERS; OSCILLATIONS;
D O I
10.3390/mi11040364
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Nanoscale metal-oxide-semiconductor field-effect-transistors (MOSFETs) with only one defect at the interface can potentially become a single electron turnstile linking frequency and electronic charge to realize the elusive quantized current source. Charge pumping is often described as a process that 'pumps' one charge per driving period per defect. The precision needed to utilize this charge pumping mechanism as a quantized current source requires a rigorous demonstration of the basic charge pumping mechanism. Here we present experimental results on a single-defect MOSFET that shows that the one charge pumped per cycle mechanism is valid. This validity is also discussed through a variety of physical arguments that enrich the current understanding of charge pumping. The known sources of errors as well as potential sources of error are also discussed. The precision of such a process is sufficient to encourage further exploration of charge pumping based on quantum current sources.
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页数:10
相关论文
共 38 条
[1]  
[Anonymous], 2018, P 26 GEN C WEIGHTS M
[2]   Coherent quantum phase slip [J].
Astafiev, O. V. ;
Ioffe, L. B. ;
Kafanov, S. ;
Pashkin, Yu. A. ;
Arutyunov, K. Yu. ;
Shahar, D. ;
Cohen, O. ;
Tsai, J. S. .
NATURE, 2012, 484 (7394) :355-358
[3]   COULOMB BLOCKADE OF SINGLE-ELECTRON TUNNELING, AND COHERENT OSCILLATIONS IN SMALL TUNNEL-JUNCTIONS [J].
AVERIN, DV ;
LIKHAREV, KK .
JOURNAL OF LOW TEMPERATURE PHYSICS, 1986, 62 (3-4) :345-373
[4]   Gigahertz quantized charge pumping [J].
Blumenthal, M. D. ;
Kaestner, B. ;
Li, L. ;
Giblin, S. ;
Janssen, T. J. B. M. ;
Pepper, M. ;
Anderson, D. ;
Jones, G. ;
Ritchie, D. A. .
NATURE PHYSICS, 2007, 3 (05) :343-347
[5]   CHARGE PUMPING IN MOS DEVICES [J].
BRUGLER, JS ;
JESPERS, PGA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1969, ED16 (03) :297-+
[6]   Density of states of Pb1 Si/SiO2 interface trap centers [J].
Campbell, JP ;
Lenahan, PM .
APPLIED PHYSICS LETTERS, 2002, 80 (11) :1945-1947
[7]   ATOMIC HYDROGEN-INDUCED DEGRADATION OF THE SI/SIO2 STRUCTURE [J].
CARTIER, E ;
STATHIS, JH .
MICROELECTRONIC ENGINEERING, 1995, 28 (1-4) :3-10
[8]  
Cheung K.P., 2001, Plasma charging damage
[9]   Local Field Effect on Charge-Capture/ Emission Dynamics [J].
Cheung, Kin P. ;
Veksler, Dmitry ;
Campbell, Jason P. .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2017, 64 (12) :5099-5106
[10]   FREQUENCY-LOCKED TURNSTILE DEVICE FOR SINGLE ELECTRONS [J].
GEERLIGS, LJ ;
ANDEREGG, VF ;
HOLWEG, PAM ;
MOOIJ, JE ;
POTHIER, H ;
ESTEVE, D ;
URBINA, C ;
DEVORET, MH .
PHYSICAL REVIEW LETTERS, 1990, 64 (22) :2691-2694