Low-operation voltage of InGaN/GaN light-emitting diodes by using a Mg-doped Al0.15Ga0.85N/GaN superlattice

被引:48
作者
Sheu, JK [1 ]
Chi, GC
Jou, MJ
机构
[1] Natl Cent Univ, Ctr Opt Sci, Chungli 320, Taiwan
[2] Epistar Corp, Hsinchu 300, Taiwan
关键词
GaN; InGaN; light-emitting diode; strained-layer superlattices;
D O I
10.1109/55.915597
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Low-resistivity Mg-doped Al0.15Ga0.85N/GaN strained-layer superlattices were grown. In these superlattices, the maximum hole concentration is 3 x 10(18)/cm(3) at room temperature. Hall-effect measurements indicate high conductivity of this structure in which the high activation efficiency is attributed to the strain-induced piezoelectric fields. This work also fabricated InGaN/GaN blue LEDs that consist of a Mg-doped Al0.15Ga0.85N/GaN SLs. Experimental results indicate that the LEDs can achieve a lower operation voltage of around 3 V, i.e., smaller than conventional devices which have an operation voltage of about 3.8 V.
引用
收藏
页码:160 / 162
页数:3
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