Determination of the morphology of deposited islands by grazing-incidence small-angle scattering

被引：27

作者：

Naudon, A ^{[1
]}

Thiaudiere, D ^{[1
]}

机构：

[1] UNIV PARIS 11,CEA,MEN,LAB UTILISAT RAYONNEMENT ELECTROMAGNET,CNRS,F-91405 ORSAY,FRANCE

来源：

SURFACE & COATINGS TECHNOLOGY | 1996年 / 79卷 / 1-3期

关键词：

X-ray scattering; small-angle; grazing incidence; clusters;

D O I：

10.1016/0257-8972(95)02451-4

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

It is shown that grazing-incidence small-angle X-ray scattering (GISAXS) is a suitable technique to study the morphology of gold islands deposited on a silicon wafer covered by a carbon sublayer. New possibilities of this technique are realized when using no a synchrotron source (flux and collimation) and when patterns are recorded with image plates (IPs). It is possible to study the anisotropic shape of the scattering pattern and to deduce the dimensions of the deposited clusters which are formed by the Volmer-Weber mechanism of film growth. Quantitative measurements can be made with a reference sample, leading to an absolute value of the scattered intensity.

引用

页码：103 / 107

页数：5

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