First demonstration of X-ray mirrors using focused ion beam

被引：8

作者：

Numazawa, Masaki ^{[1
]}

Ezoe, Yuichiro ^{[1
]}

Ishikawa, Kumi ^{[2
]}

Ogawa, Tomohiro ^{[1
]}

Sato, Mayu ^{[1
]}

Nakamura, Kasumi ^{[1
]}

Takeuchi, Kazuma ^{[1
]}

Terada, Masaru ^{[1
]}

Ohashi, Takaya ^{[1
]}

Mitsuda, Kazuhisa ^{[3
]}

Kelley, Ron ^{[4
]}

Murata, Kaoru ^{[5
]}

机构：

[1] Tokyo Metropolitan Univ, Hachioji, Tokyo 1920397, Japan

[2] RIKEN, 2-1 Hirosawa, Wako, Saitama 3510198, Japan

[3] JAXA, ISAS, Sagamihara, Kanagawa 2525210, Japan

[4] FEI Co, Hillsboro, OR 97124 USA

[5] FEI Japan NanoPort, Minato Ku, Tokyo 1080075, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2016年 / 55卷 / 06期

关键词：

SILICON-WAFERS; OPTICS;

D O I：

10.7567/JJAP.55.06GP11

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report on novel X-ray mirrors fabricated with a focused ion beam for future astronomical missions. We fabricated a test sample from a silicon wafer by forming six slits whose sidewalls were used as X-ray reflection surfaces. The six slits were designed with a size of 25 x 300 x 170 mu m(3) and with different inclination angles of 0 and +/- 1 degrees. We examined X-ray reflection using three slits with different inclination angles at Al K alpha 1.49 keV. Consequently, we demonstrated X-ray reflection from all the three slits. All the sidewalls have multiangular components with a microroughness of similar to 1 nm rms. similar to 30-45% of the total surface area is effective for X-ray reflection. We confirmed that the inclination angles are consistent with the designed values. (C) 2016 The Japan Society of Applied Physics

引用

页数：5

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