Excellent Selector Characteristics of Nanoscale VO2 for High-Density Bipolar ReRAM Applications

被引:257
作者
Son, Myungwoo [1 ,2 ]
Lee, Joonmyoung [1 ,2 ]
Park, Jubong [1 ,2 ]
Shin, Jungho [1 ,2 ]
Choi, Godeuni [1 ,2 ]
Jung, Seungjae [1 ,2 ]
Lee, Wootae [1 ,2 ]
Kim, Seonghyun [1 ,2 ]
Park, Sangsu [1 ,2 ]
Hwang, Hyunsang [1 ,2 ]
机构
[1] Gwangju Inst Sci & Technol, Dept Nanobio Mat & Elect, Kwangju 500712, South Korea
[2] Gwangju Inst Sci & Technol, Sch Mat Sci & Engn, Kwangju 500712, South Korea
基金
新加坡国家研究基金会;
关键词
Nanoscale device; resistive random access memory (ReRAM); selection device; vanadium oxide (VO2);
D O I
10.1109/LED.2011.2163697
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We herein present a nanoscale vanadium oxide (VO2) device with excellent selector characteristics such as a high ON/ OFF ratio (> 50), fast switching speed (< 20 ns), and high current density (> 10(6) A/ cm(2)). Owing to extrinsic defects, a large-area device with a 20-nm-thick VO2 layer underwent an electrical short. In contrast, after scaling the device active area (< 5 x 10(4) nm(2)), excellent switching uniformity was obtained. This can be explained by the reduced defects and the metal-insulator transition of the whole nanoscale VO2. By integrating a bipolar resistive random access memory device with the VO2 selection device, a significantly improved readout margin was obtained. The VO2 selection device shows good potential for cross-point bipolar resistive memory applications.
引用
收藏
页码:1579 / 1581
页数:3
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