Ruddlesden-Popper faults in LaNiO3/LaAlO3 superlattices

被引：32

作者：

Detemple, E. ^{[1
]}

Ramasse, Q. M. ^{[2
]}

Sigle, W. ^{[1
]}

Cristiani, G. ^{[3
]}

Habermeier, H. -U. ^{[3
]}

Keimer, B. ^{[3
]}

van Aken, P. A. ^{[1
]}

机构：

[1] Max Planck Inst Intelligent Syst, D-70569 Stuttgart, Germany

[2] STFC Daresbury, SuperSTEM Lab, Warrington WA4 4AD, Cheshire, England

[3] Max Planck Inst Solid State Res, D-70569 Stuttgart, Germany

来源：

JOURNAL OF APPLIED PHYSICS | 2012年 / 112卷 / 01期

关键词：

OXIDE;

D O I：

10.1063/1.4731249

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Scanning transmission electron microscopy in combination with electron energy-loss spectroscopy is used to study LaNiO3/LaAlO3 superlattices grown on (La,Sr) AlO4 with varying single-layer thicknesses, which are known to control their electronic properties. The microstructure of the films is investigated on the atomic level and the role of observed defects is discussed in the context of the different properties. Two types of Ruddlesden-Popper faults are found, which are either two or three dimensional. The common planar Ruddlesden-Popper fault is induced by steps on the substrate surface. In contrast, the three-dimensionally arranged Ruddlesden-Popper fault, whose size is in the nanometer range, is caused by the formation of local stacking faults during film growth. Furthermore, the interfaces of the superlattices are found to show different sharpness, but the microstructure does not depend substantially on the single-layer thickness. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4731249]

引用

页数：5

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