Vapor-liquid-solid growth of III-Nitride nanowires and heterostructures by metal-organic chemical vapor deposition

被引:0
作者
Su, J [1 ]
Gherasimova, M [1 ]
Cui, G [1 ]
Han, J [1 ]
Lim, S [1 ]
Ciuparu, D [1 ]
Pfefferle, L [1 ]
He, Y [1 ]
Nurmikko, AV [1 ]
Broadbridge, C [1 ]
Lehman, A [1 ]
Onuma, T [1 ]
Kurimoto, M [1 ]
Chichibu, SF [1 ]
机构
[1] Yale Univ, Fac Engn & Appl Sci, New Haven, CT 06520 USA
来源
GAN, AIN, INN AND THEIR ALLOYS | 2005年 / 831卷
关键词
D O I
暂无
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report flexible synthesis of III-Nitride nanowires and heterostructures by metal-organic chemical vapor deposition (MOCVD) via a catalytic vapor-liquid-solid (VLS) growth mechanism. Indium is used as an in-situ catalyst to facilitate and sustain the stability of liquid phase droplet for VLS growth based on thermodynamic consideration. The employment of mesoporous molecular sieves (MCM-41) helps to prevent the coalescence of catalyst droplets and to promote nucleation statistics. Cathodoluminescence (CL) of GaN nanowires shows near band-edge emission at 370nm, and strong E-2 phonon peak is observed at room temperature in Raman scattering spectra. Both binary GaN and AlN nanowires have been synthesized by MOCVD. Three-dimensional AlN/GaN trunk-branch nanostructures are reported to illustrate the versatility of incorporating the VLS mechanism into MOCVD process.
引用
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页码:753 / 758
页数:6
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