Backscattering of low energy electrons from carbon films deposited on aluminum: A Monte Carlo simulation

被引:18
作者
Dapor, M [1 ]
机构
[1] Ctr Ric Sci & Tecnol, I-38050 Trento, Italy
关键词
D O I
10.1063/1.1633655
中图分类号
O59 [应用物理学];
学科分类号
摘要
The low energy backscattering coefficient for the special case of film of carbon deposited on aluminum is investigated. The backscattering coefficient as a function of the primary energy shows an interesting property, i.e., the appearance-for carbon film thicknesses higher than similar to100 A on aluminum-of relative maxima of absorption (and relative minima of backscattering). It has been noted, for aluminum substrates, that the position of the relative minima of the backscattering coefficient is increasing as the carbon film thickness increases. If experimentally confirmed and quantitatively accurately defined, the results presented-here obtained through a Monte Carlo simulation-can be used as a way to measure the carbon film thickness by a set of measures of the backscattering coefficient. (C) 2004 American Institute of Physics.
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页码:718 / 721
页数:4
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