Hysteresis of Transistor Characteristics of Amorphous IGZO TFTs Studied by Controlling Measurement Speed

被引:17
作者
Chen, Yi-Jung [1 ,2 ]
Tai, Ya-Hsiang [3 ,4 ]
机构
[1] Natl Chiao Tung Univ, Dept Photon, Hsinchu 30010, Taiwan
[2] Natl Chiao Tung Univ, Inst Electroopt Engn, Hsinchu 30010, Taiwan
[3] Natl Chiao Tung Univ, Dept Photon, Hsinchu 30010, Taiwan
[4] Natl Chiao Tung Univ, Inst Display, Hsinchu 30010, Taiwan
关键词
THIN-FILM TRANSISTORS; BIAS STRESS; TEMPERATURE; DEGRADATION; GATE;
D O I
10.1149/2.0041504ssl
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We investigate the hysteresis in the transfer characteristic of amorphous indium-gallium-zinc-oxide thin-film transistor by controlling the sweep waveform of the gate voltage (Vg) provided by parameter measure unit. It is conventionally studied by double sweeping Vg with the default setup of the source measure units, which speed may vary with the current level. By manipulating the step time of sweeping Vg, we found that the response time of charge traps or donor-like states is in the range that overlaps with the conventional time step in the measurement and must be considered. (C) The Author(s) 2015. Published by ECS. All rights reserved.
引用
收藏
页码:Q10 / Q12
页数:3
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