Kinetics of OH radical reactions with a series of symmetric acetals in the temperature range 293-617 K

被引:17
作者
Vovelle, C
Bonard, A
Daële, V
Delfau, JL
机构
[1] CNRS, Lab Combust & Syst React, F-45071 Orleans 2, France
[2] Univ Orleans, F-45071 Orleans, France
关键词
D O I
10.1039/b105650f
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Rate constants of the reactions of OH radicals with dimethoxymethane, diethoxymethane and dipropoxymethane have been measured in the temperature range 293-619 K at a total pressure of 100 Torr. The pulse laser photolysis-laser induced fluorescence technique (PLP-LIF) was used with OH radicals produced by photolysis of H2O2 at lambda = 266 nm. Combining data so obtained with recent determinations at lower temperatures shows that, for the three acetals, the Arrhenius plots exhibit a minimum. A three-parameter Arrhenius expression reproduces the minimum but the temperature exponent and the preexponential factor have unrealistic values. For the three reactions, a better description of the temperature dependence was obtained by fitting the rate constant by the sum of two functions corresponding to different reaction pathways at low and high temperature.
引用
收藏
页码:4939 / 4945
页数:7
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