UV-curable nanoimprint resin with enhanced anti-sticking property

被引：39
|
作者：
Kim, Joo Yeon [1 ]
Choi, Dae-Geun [1 ]
Jeong, Jun-Ho [1 ]
Lee, Eung-Sug [1 ]
机构：
[1] KIMM, Nanomech Syst Res Ctr, Taejon 305343, South Korea
来源：
APPLIED SURFACE SCIENCE | 2008年 / 254卷 / 15期
关键词：
UV nanoimprinting lithography (UV-NIL); micro- and nano-scale pattern; anti-sticking layer;
D O I：
10.1016/j.apsusc.2008.01.095
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
This paper reports on a newly developed anti-sticking resin obtained by mixing a fluorine-containing monomer (F-monomer) for UV nanoimprinting lithography (UV-NIL) to reduce the contact adhesion force during the demolding process. The new resin system shows an enhanced reliability and resolution of pattern transfer with no treatment on the surface of the quartz stamp. We fabricated various nanopatterns with F-monomer resins of various concentrations in the low pressure UV-NIL. The number of process steps of a release layer treatment for UV-NIL was reduced by using F-monomer with anti-sticking property. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码：4793 / 4796
页数：4
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