Ultra-low threshold polariton lasing in photonic crystal cavities

被引：62

作者：

Azzini, Stefano ^{[1
,2
]}

Gerace, Dario ^{[1
,2
]}

Galli, Matteo ^{[1
,2
]}

Sagnes, Isabelle ^{[3
]}

Braive, Remy ^{[3
]}

Lemaitre, Aristide ^{[3
]}

Bloch, Jacqueline ^{[3
]}

Bajoni, D. ^{[2
,4
]}

机构：

[1] Dipartimento Fis A Volta, I-27100 Pavia, Italy

[2] UdR CNISM, I-27100 Pavia, Italy

[3] CNRS, Lab Photon & Nanostruct, F-91460 Marcoussis, France

[4] Dipartimento Elettron, I-27100 Pavia, Italy

来源：

APPLIED PHYSICS LETTERS | 2011年 / 99卷 / 11期

关键词：

LASERS; LITHOGRAPHY; FABRICATION;

D O I：

10.1063/1.3638469

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The authors show clear experimental evidence of lasing of exciton polaritons confined in L3 photonic crystal cavities. The samples are based on an InP membrane in air containing five InAsP quantum wells. Polariton lasing is observed with thresholds as low as 120 nW, below the Mott transition, while conventional photon lasing is observed for a pumping power one to three orders of magnitude higher. (C) 2011 American Institute of Physics. [doi:10.1063/1.3638469]

引用

页数：3

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