Hole Gas Induced by Defects in Ge/Si Core-Shell Nanowires

被引:2
作者
Park, J. -S. [1 ]
Ryu, B. [1 ]
Moon, C. -Y. [2 ,3 ]
Chang, K. J. [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Dept Phys, Daejeon 305701, South Korea
[2] Yonsei Univ, Dept Phys, Seoul 120749, South Korea
[3] Yonsei Univ, IPAP, Seoul 120749, South Korea
来源
PHYSICS OF SEMICONDUCTORS: 30TH INTERNATIONAL CONFERENCE ON THE PHYSICS OF SEMICONDUCTORS | 2011年 / 1399卷
关键词
Core-shell nanowire; dangling bond defect; Au impurity; electronic structure; TOTAL-ENERGY CALCULATIONS; WAVE BASIS-SET; HETEROSTRUCTURES;
D O I
10.1063/1.3666374
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We investigate the defect levels of surface Si dangling bond (DB) and substitutional Au defects at/near the surfaces of Ge/Si core-shell nanowires through spin-polarized density-functional calculations. Both surface Si DB and substitutional Au defects induce hole carriers in the Ge core by trapping electrons from the valence band maximum state. The reduced scattering by spatial separation of hole carriers and charge traps leads to the ballistic transport in core-shell nanowire structures.
引用
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页数:2
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