Electrodeposition of Continuous Silicon Coatings from the KF-KCl-K2SiF6 Melts

被引：34

作者：

Zhuk, Sergey I. ^{[1
]}

Isakov, Andrey V. ^{[1
]}

Apisarov, Alexey P. ^{[1
]}

Grishenkova, Olga V. ^{[1
]}

Isaev, Vladimir A. ^{[1
]}

Vovkotrub, Emma G. ^{[1
]}

Zaykov, Yurii P. ^{[1
]}

机构：

[1] Russian Acad Sci, Inst High Temp Electrochem, Ural Branch, Ekaterinburg 620990, Russia

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 2017年 / 164卷 / 08期

基金：

俄罗斯科学基金会;

关键词：

RAMAN-SCATTERING; MOLTEN; SIO2; CRYSTALLINE; REDUCTION; NANOPARTICLES; BEHAVIOR; CACL2; ION;

D O I：

10.1149/2.0171708jes

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The silicon electrodeposition from the KF-KCl-(10 mol%) K2SiF6 melt at 943-1103 K has been studied. The polycrystalline continuous single-phase silicon coatings (similar to 99.9 wt% Si) have been obtained on the graphite, glassy carbon, silver, and tungsten substrates. The Raman spectroscopic study of the Si/C and Si/Ag interfaces has proved an absence of the intermediate phases. Two phases (Si and Ni2Si) were formed during the silicon electrodeposition on nickel. (C) The Author(s) 2017. Published by ECS. This is an open access article distributed under the terms of the Creative Commons Attribution 4.0 License (CC BY, http://creativecommons.org/licenses/by/4.0/), which permits unrestricted reuse of the work in any medium, provided the original work is properly cited. All rights reserved.

引用

页码：H5135 / H5138

页数：4

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