A new design principle for the photoactive components (PACs) of dissolution inhibition resists

被引:8
作者
Jha, S
Reiser, A
Sroubkova, L
Zahradnik, R
机构
[1] Polytech Univ, Inst Imaging Sci, Brooklyn, NY 11201 USA
[2] Acad Sci Czech Republ, J Heyrovsky Inst Phys Chem, CR-18223 Prague, Czech Republic
关键词
D O I
10.1021/ma980574c
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The photoreactive function and the inhibitor function of the Photoactive components (PACs) of dissolution inhibition resists are independent of each other and have to be considered and developed separately. Traditionally, dissolution inhibitors have been designed by trial and error. Here we are concerned with a rational approach to inhibitor design based on the proposition that the inhibition strength of a molecule depends directly on the electron density on the oxygen atom of its acceptor group. Any structural change that increases the electron density on the acceptor increases also the inhibition factor of the molecule. Several routes to more effective inhibitors are indicated.
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页码:6549 / 6553
页数:5
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