Fast resistive reconnection regime in the nonlinear evolution of double tearing modes

被引:118
作者
Wang, Z. X. [1 ]
Wang, X. G.
Dong, J. Q.
Lei, Y. A.
Long, Y. X.
Mou, Z. Z.
Qu, W. X.
机构
[1] Peking Univ, Sch Phys, Beijing 100871, Peoples R China
[2] Dalian Univ Technol, Sch Phys & Optoelect Technol, State Key Lab Mat Modificat Beams, Dalian 116024, Peoples R China
[3] SW Inst Phys, Chengdu 610041, Peoples R China
[4] Zhejiang Univ, Inst Fus Theory & Simulat, Hangzhou 310027, Peoples R China
关键词
D O I
10.1103/PhysRevLett.99.185004
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Phases of nonlinear double tearing modes are studied numerically. The first two phases lead to the formation and growth of magnetic islands and are followed by a fast reconnection phase to complete the process, driven by a process of neighboring magnetic separatrices merging and magnetic islands coupling. The fast growth can be understood as a result of the island interaction equivalent to a steadily inward flux boundary driven. Resistivity dependences for various phases are studied and shown by scaling analysis for the first time. It is found that after an early Sweet-Parker phase with a eta(1/2)-scale, a slow nonlinear phase in a Rutherford regime with a eta(1)-scale is followed by the fast reconnection phase with a eta(1/5)-scale.
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页数:4
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