Vapor Treatment and In-situ Recrystallization by Copper Chloride on Cu(In,Ga)Se2 Thin Film

被引:1
作者
Belfore, Benjamin [1 ]
Poudel, Deewakar [1 ]
Ashrafee, Tasnuva [1 ]
Palmiotti, Elizabeth [2 ]
Lepetit, Thomas [3 ]
Karki, Shankar [1 ]
Rajan, Grace [1 ]
Rockett, Angus [2 ]
Marsillac, Sylvain [1 ]
机构
[1] Old Dominion Univ, Virginia Inst Photovolta, Norfolk, VA 23529 USA
[2] Colorado Sch Mines, Dept Met & Mat Engn, Golden, CO 80401 USA
[3] Univ Nantes, Inst Mat Jean Rouxel, Nantes, France
来源
2021 IEEE 48TH PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC) | 2021年
关键词
CIGS; recrystallization; CuCl2; thin film; TIME SPECTROSCOPIC ELLIPSOMETRY; BUFFER LAYER; BETA-IN2S3; DEPOSITION; DEVICES; GROWTH; IN2S3; CIGS;
D O I
10.1109/PVSC43889.2021.9518617
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Deposition of CIGS semiconductor thin films was performed at low temperature and high rate by three-stage co-evaporation process on molybdenum coated glass substrate. A vapor treatment was done in between the second and third stage by flashing CuCl2 for 5 mins at 400 degrees C. A large change in morphology and crystal structure was observed after the treatment. XRD and SEM showed that small grains transformed into large grains. A smoother Ga profile was observed by SIMS measurements for the treated films as compared to as-deposited films. Furthermore, the Na profile was also modified in the recrystallized samples, with a lower content after recrystallization.
引用
收藏
页码:2316 / 2319
页数:4
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