Reactive gold thin films grown on iridium

被引:13
|
作者
Okada, M
Ogura, S
Diño, WA
Wilde, M
Fukutani, K
Kasai, T
机构
[1] Osaka Univ, Grad Sch Sci, Dept Chem, Toyonaka, Osaka 5600043, Japan
[2] Univ Tokyo, Inst Ind Sci, Meguro Ku, Tokyo 1538505, Japan
[3] Osaka Univ, Grad Sch Engn, Dept Appl Phys, Suita, Osaka 5650871, Japan
[4] Japan Sci & Technol Agcy, Kawaguchi, Saitama 3320012, Japan
[5] De La Salle Univ, Dept Phys, Manila 1004, Philippines
关键词
gold; iridium; hydrogen; nuclear reaction analysis; dissociative adsorption;
D O I
10.1016/j.apsusc.2004.10.051
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report results of our studies on the dissociative adsorption of hydrogen on An thin films grown epitaxially on Ir{111} surface, using nuclear reaction analysis. We found that H-2 dissociatively adsorbs on these Au {111} films. This feature can be contrasted to the well-known noble bulk Au surfaces, which do not dissociate hydrogen molecules. We attribute this to the local surface properties, e.g., electron localization (the narrowing of the s-band, the s-band center model), which can explain the unexpected high reactivity of a thin An {111} film. (c) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:68 / 71
页数:4
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