A single-crystal silicon 3-axis CMOS-MEMS accelerometer

被引:20
作者
Qu, HW [1 ]
Fang, DY [1 ]
Xie, HK [1 ]
机构
[1] Univ Florida, Dept Elect & Comp Engn, Gainesville, FL 32611 USA
来源
PROCEEDINGS OF THE IEEE SENSORS 2004, VOLS 1-3 | 2004年
关键词
integrated accelerometer; 3-axis accelerometer; aluminum etching; CMOS-MEMS;
D O I
10.1109/ICSENS.2004.1426253
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper presents a single-crystal silicon (SCS)-based, integrated 3-axis accelerometer fabricated using a post-CMOS micromachining process. This new CMOS-MEMS process provides monolithic integration of electronics and SCS microstructures, and electrical isolation of silicon. By employing a unique vertical sensing mechanism, 3-axis acceleration sensing is achieved with a single proof mass. The symmetric structures and fully differential configuration of all the sensing electrodes can greatly reduce the cross couplings among the 3 axes. By sacrificing one interconnect metal layer, the silicon undercut of the sensing comb fingers is minimized, resulting in much higher sensitivity with the same device footprint. A wet Al etching process was also developed to remove the top Al layer without attacking the Al layers exposed from the sidewalls of the multilayer Al/oxide stacks. A two-stage, open-loop, continuous time chopper stabilized amplifier is integrated on the chip.
引用
收藏
页码:661 / 664
页数:4
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