Structural characterization of thin films and multilayer structures

Atomic force microscopy has been used to study the structure, down to the nanoscale, of thin-film and multilayer samples. Due to the fact that atomic force microscopy is not restricted to conducting surfaces, it is possible to image mesoscopic rings, lines, and more complex structures deposited on insulating substrates. X-ray diffraction provides access to the internal structure of the layers, interface roughness and the lateral periodicity of antidot lattices. Comparison of atomic force microscopy and x-ray diffraction on molecular beam epitaxy grown Nb/Cu multilayers shows that high-angle diffraction averages over a lateral length which is in good agreement with the typical grain size.